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Electrical and optical properties of Ti doped ZnO films grown on glass substrate by atomic layer deposition
Wan, Zhixin, Kwack, Won-Sub, Lee, Woo-Jae, Jang, Seung-II, Kim, Hye-Ri, Kim, Jin-Woong, Jung, Kang-Won, Min, Won-Ja, Yu, Kyu-Sang, Park, Sung-Hun, Yun, Eun-Young, Kim, Jin-Hyock, Kwon, Se-Hun
Published in Materials research bulletin (01.09.2014)
Published in Materials research bulletin (01.09.2014)
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Journal Article
Dependence of the capacitance between an electrode and an electrolyte solution on the thickness of aluminum oxide layers deposited using atomic layer deposition
Lee, Hyunwoo, Chang, Byoung-Yong, Kwack, Won-Sub, Jo, Kyungmin, Jeong, Jinkyo, Kwon, Se-Hun, Yang, Haesik
Published in Journal of electroanalytical chemistry (Lausanne, Switzerland) (01.07.2013)
Published in Journal of electroanalytical chemistry (Lausanne, Switzerland) (01.07.2013)
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Journal Article
Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
Jeong, Seong-Jun, Shin, Yu-Ri, Kwack, Won-Sub, Lee, Hyung Woo, Jeong, Young-Keun, Kim, Doo-In, Kim, Hyun Chang, Kwon, Se-Hun
Published in Surface & coatings technology (25.08.2011)
Published in Surface & coatings technology (25.08.2011)
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Journal Article
Structural and electrical properties of ternary Ru–AlN thin films prepared by plasma-enhanced atomic layer deposition
Shin, Yu-Ri, Kwack, Won-Sub, Park, Yun Chang, Kim, Jin-Hyock, Shin, Seung-Yong, Moon, Kyoung Il, Lee, Hyung-Woo, Kwon, Se-Hun
Published in Materials research bulletin (01.03.2012)
Published in Materials research bulletin (01.03.2012)
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Journal Article