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Research on the distributed capacitance for high-voltage key components on CRAFT NNBI
LIU, Bo, LIU, Zhimin, JIANG, Caichao, LIU, Sheng, PAN, Junjun, CHEN, Shiyong, WEI, Wei, QU, Yuchen, LIANG, Lizhen, BAI, Ruoxin, XIE, Yuanlai
Published in Plasma science & technology (01.04.2025)
Published in Plasma science & technology (01.04.2025)
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Journal Article
Comprehensive research facility for negative ion source neutral beam injection at CRAFT: design and first operation
WEI, Jianglong, XIE, Yahong, XIE, Yuanlai, JIANG, Caichao, ZHAO, Yuanzhe, XU, Yongjian, GU, Yuming, YI, Wei, LIU, Wei, BU, Lyuyang, YAN, Dezhi, LIU, Zhimin, LIU, Sheng, PAN, Junjun, CHEN, Shiyong, YU, Ling, CUI, Qinglong, SONG, Shihua, CHEN, Yuqing, WANG, Ji, LIU, Ling, PAN, Shengmin, GUO, Bin, ZHU, Zhigang, WANG, Na, XIE, Junwei, YANG, Yuwen, ZHU, Tengsai, YANG, Lixin, LI, Yufan, TANG, Ning, WANG, Qianxu, HONG, Huihui, LIU, Bo, LI, Yuqian, LI, Yang, GU, Yu, PENG, Xufeng, LIU, Shanhu, WU, Yong, MENG, Xiancai, HU, Chundong, LIANG, Lizhen
Published in Plasma science & technology (01.04.2025)
Published in Plasma science & technology (01.04.2025)
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Journal Article