Chemical process design and simulation : Aspen Plus and Aspen HYSYS applications

A comprehensive and example oriented text for the study of chemical process design and simulation Chemical Process Design and Simulation is an accessible guide that offers information on the most important principles of chemical engineering design and includes illustrative examples of their applicat...

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Bibliographic Details
Main Author: Haydary, Juma, (Author)
Format: eBook
Language: English
Published: Hoboken, NJ : John Wiley & Sons, Inc. : American Institute of Chemical Engineers, 2019.
Subjects:
ISBN: 9781119311447
1119311446
9781119311478
1119311470
9781119089117
1119089115
9781119311430
1119311438
1523143886
9781523143887
Physical Description: 1 online resource (xliv, 391 pages) : illustrations

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Table of contents

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003 OCoLC
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006 m o d
007 cr cn|||||||||
008 181219s2019 njua ob 001 0 eng d
040 |a N$T  |b eng  |e rda  |e pn  |c N$T  |d N$T  |d DG1  |d YDX  |d OCLCF  |d CNCGM  |d COO  |d OCLCQ  |d OCLCO  |d CDN  |d EBLCP  |d UHL  |d UKAHL  |d CDN  |d RECBK  |d NLW  |d OCLCQ  |d ZCU  |d OCLCQ  |d SFB  |d OCLCO 
020 |a 9781119311447  |q (electronic bk.) 
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020 |a 1119311470  |q (electronic bk. ;  |q oBook) 
020 |z 9781119089117 
020 |z 1119089115 
020 |a 9781119311430  |q (electronic bk.) 
020 |a 1119311438 
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020 |a 9781523143887 
035 |a (OCoLC)1079399098  |z (OCoLC)1079866690  |z (OCoLC)1080082371  |z (OCoLC)1084717301  |z (OCoLC)1100433162  |z (OCoLC)1104297963  |z (OCoLC)1104401847  |z (OCoLC)1355234684  |z (OCoLC)1390571851  |z (OCoLC)1423211873  |z (OCoLC)1424762116 
100 1 |a Haydary, Juma,  |e author. 
245 1 0 |a Chemical process design and simulation :  |b Aspen Plus and Aspen HYSYS applications /  |c Juma Haydary. 
264 1 |a Hoboken, NJ :  |b John Wiley & Sons, Inc. :  |b American Institute of Chemical Engineers,  |c 2019. 
300 |a 1 online resource (xliv, 391 pages) :  |b illustrations 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
504 |a Includes bibliographical references and index. 
505 0 |a Intro; Chemical Process Design and Simulation; Contents; List of Tables; List of Figures; About the Author; Preface; Acknowledgments; Abbreviations; Symbols; About the Companion Website; Chemical Process Design and Simulation -- Aspen Plus and Aspen HYSYS Applications; Instructions for using supplementary materials; Part I Introduction to Design and Simulation; 1 Introduction to Computer-Aided Process Design and Simulation; 1.1 Process Design; 1.2 Process Chemistry Concept; 1.3 Technology Concept; 1.4 Data Collection; 1.4.1 Material Properties Data; 1.4.2 Phase Equilibrium Data 
505 8 |a 1.4.3 Reaction Equilibrium and Reaction Kinetic Data1.5 Simulation of an Existing Process; 1.6 Development of Process Flow Diagrams; 1.7 Process Simulation Programs; 1.7.1 Sequential Modular versus Equation-Oriented Approach; 1.7.2 Starting a Simulation with Aspen Plus; 1.7.3 Starting a Simulation with Aspen HYSYS; 1.8 Conventional versus Nonconventional Components; 1.9 Process Integration and Energy Analysis; 1.10 Process Economic Evaluation; References; 2 General Procedure for Process Simulation; 2.1 Component Selection; 2.2 Property Methods and Phase Equilibrium 
505 8 |a 2.2.1 Physical Property Data Sources2.2.2 Phase Equilibrium Models; 2.2.3 Selection of a Property Method in Aspen Plus; 2.2.4 Selection of a Property Package in Aspen HYSYS; 2.2.5 Pure Component Property Analysis; 2.2.6 Binary Analysis; 2.2.7 Azeotrope Search and Analysis of Ternary Systems; 2.2.8 PT Envelope Analysis; 2.3 Chemistry and Reactions; 2.4 Process Flow Diagrams; References; Part II Design and Simulation of Single Unit Operations; 3 Heat Exchangers; 3.1 Heater and Cooler Models; 3.2 Simple Heat Exchanger Models; 3.3 Simple Design and Rating of Heat Exchangers 
505 8 |a 3.4 Detailed Design and Simulation of Heat Exchangers3.4.1 HYSYS Dynamic Rating; 3.4.2 Rigorous Shell and Tube Heat Exchanger Design Using EDR; 3.5 Selection and Costing of Heat Exchangers; References; 4 Pressure Changing Equipment; 4.1 Pumps, Hydraulic Turbines, and Valves; 4.2 Compressors and Gas Turbines; 4.3 Pressure Drop Calculations in Pipes; 4.4 Selection and Costing of Pressure Changing Equipment; References; 5 Reactors; 5.1 Material and Enthalpy Balance of a Chemical Reactor; 5.2 Stoichiometry and Yield Reactor Models; 5.3 Chemical Equilibrium Reactor Models 
505 8 |a 5.3.1 REquil Model of Aspen Plus5.3.2 Equilibrium Reactor Model of Aspen HYSYS; 5.3.3 RGibbs Model of Aspen Plus and Gibbs Reactor Model of Aspen HYSYS; 5.4 Kinetic Reactor Models; 5.5 Selection and Costing of Chemical Reactors; References; 6 Separation Equipment; 6.1 Single Contact Phase Separation; 6.2 Distillation Column; 6.2.1 Shortcut Distillation Method; 6.2.2 Rigorous Methods; 6.3 Azeotropic and Extractive Distillation; 6.4 Reactive Distillation; 6.5 Absorption and Desorption; 6.6 Extraction; 6.7 Selection and Costing of Separation Equipment; 6.7.1 Distillation Equipment 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty 
520 |a A comprehensive and example oriented text for the study of chemical process design and simulation Chemical Process Design and Simulation is an accessible guide that offers information on the most important principles of chemical engineering design and includes illustrative examples of their application that uses simulation software. A comprehensive and practical resource, the text uses both Aspen Plus and Aspen Hysys simulation software. The author describes the basic methodologies for computer aided design and offers a description of the basic steps of process simulation in Aspen Plus and Aspen Hysys. The text reviews the design and simulation of individual simple unit operations that includes a mathematical model of each unit operation such as reactors, separators, and heat exchangers. The author also explores the design of new plants and simulation of existing plants where conventional chemicals and material mixtures with measurable compositions are used. In addition, to aid in comprehension, solutions to examples of real problems are included. The final section covers plant design and simulation of processes using nonconventional components. This important resource: -Includes information on the application of both the Aspen Plus and Aspen Hysys software that enables a comparison of the two software systems -Combines the basic theoretical principles of chemical process and design with real-world examples -Covers both processes with conventional organic chemicals and processes with more complex materials such as solids, oil blends, polymers and electrolytes -Presents examples that are solved using a new version of Aspen software, ASPEN One 9 Written for students and academics in the field of process design, Chemical Process Design and Simulation is a practical and accessible guide to the chemical process design and simulation using proven software. 
590 |a Knovel  |b Knovel (All titles) 
650 0 |a Chemical processes. 
650 0 |a Chemical processes  |x Computer simulation. 
650 0 |a Chemical engineering. 
650 0 |a Chemical engineering  |x Computer simulation. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
776 0 8 |i Print version: Haydary, Juma.  |t Chemical process design and simulation.  |d [New York, N.Y.?] : AIChE, the Global Home of Chemical Engineers ; Hoboken, NJ, USA : Wiley, 2019  |z 1119089115  |w (DLC) 2018459815  |w (OCoLC)1011516657 
856 4 0 |u https://proxy.k.utb.cz/login?url=https://app.knovel.com/hotlink/toc/id:kpCPDSAPA7/chemical-process-design?kpromoter=marc  |y Full text