Defects in semiconductors

This volume, number 91 in the Semiconductor and Semimetals series, focuses on defects in semiconductors. Defects in semiconductors help to explain several phenomena, from diffusion to getter, and to draw theories on materials' behavior in response to electrical or mechanical fields. The volume...

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Bibliographic Details
Other Authors: Romano, Lucia, 1977- (Editor), Privitera, Vittorio, (Editor), Jagadish, C. (Editor)
Format: eBook
Language: English
Published: Waltham, MA : Academic Press is an imprint of Elsevier, 2015.
Edition: First edition.
Series: Semiconductors and semimetals ; v. 91.
Subjects:
Semiconductors > Defects.
elektronické knihy
electronic books
ISBN: 9780128019405
0128019409
0128019352
9780128019351
Physical Description: 1 online resource

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245 0 0 |a Defects in semiconductors /  |c edited by Lucia Romano, Vittorio Privitera, Chennupati Jagadish. 
250 |a First edition. 
264 1 |a Waltham, MA :  |b Academic Press is an imprint of Elsevier,  |c 2015. 
300 |a 1 online resource 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
490 1 |a Semiconductors and semimetals,  |x 0080-8784 ;  |v volume 91 
504 |a Includes bibliographical references and index. 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty 
520 |a This volume, number 91 in the Semiconductor and Semimetals series, focuses on defects in semiconductors. Defects in semiconductors help to explain several phenomena, from diffusion to getter, and to draw theories on materials' behavior in response to electrical or mechanical fields. The volume includes chapters focusing specifically on electron and proton irradiation of silicon, point defects in zinc oxide and gallium nitride, ion implantation defects and shallow junctions in silicon and germanium, and much more. It will help support students and scientists in their experimental and theoretical paths. 
505 0 |a Front Cover; Defects in Semiconductors; Copyright; Contents; Contributors; Preface; Chapter 1: Role of Defects in the Dopant Diffusion in Si; 1. Introduction; 2. The Framework of Diffusion-Reaction Equations; 3. Diffusion of Substitutional Dopants via Intrinsic Point Defects; 3.1. Basic diffusion mechanisms; 3.2. Pair diffusion models; 3.3. System behavior; 4. Dopants in Silicon and Their Diffusion Mechanisms; 5. Nonequilibrium Processes; 6. Precipitates, Clusters, and Complexes; 6.1. Dopant phases and precipitates; 6.2. Dopant clusters; 6.3. Ion pairs; 7. Interface Segregation; References. 
505 8 |a Chapter 2: Electron and Proton Irradiation of Silicon1. Introduction; 2. Irradiation of Silicon: General Issues; 3. The Elementary Act: Frenkel Pair; 3.1. The Vacancy; 3.1.1. Electronic Structure and Electrical Level Positions; 3.1.2. Diffusion Mechanism; 3.2. The Self-Interstitial; 3.2.1. Electronic Structure and Electrical Level Positions; 3.2.2. Diffusion Mechanism; 4. Branching Reactions: Basic Considerations; 4.1. Branching Reactions of the Vacancy; 4.1.1. Annealing Under Nonequilibrium Conditions: The Case of E-Center; 4.2. Branching Reactions of the Interstitial. 
505 8 |a 5. Complexes Consisting of the Native Defects5.1. The Divacancy; 5.2. The Trivacancy; 5.3. The Di-Interstitial; 5.4. The Tri-Interstitial; 6. Summary; References; Chapter 3: Ion Implantation Defects and Shallow Junctions in Si and Ge; 1. Introduction; 2. Generation and Accumulation of Ion Implantation Damage; 3. Damage Evolution and Defect Agglomerates; 4. Role of Defects in Shallow Junction Formation in Si; 5. Role of Defects in Shallow Junction Formation in Ge; References; Chapter 4: Defective Solid-Phase Epitaxial Growth of Si; 1. Introduction; 1.1. Atomistic considerations. 
505 8 |a 1.2. Macroscopic considerations2. Role of Initial Growth Interface Morphology; 2.1. General observations of ""hairpin"" dislocations; 2.2. Very-low temperature annealing; 2.3. Stress-induced enhancement to hairpin dislocation formation; 3. ""Buried"" Amorphous Layers; 3.1. Clamshell defects for other wafer orientations; 4. Substrate Orientation Effects; 4.1. Stacking sequence variation with substrate orientation; 4.2. Observations of SPEG on (111) wafers; 5. Stressed SPEG Resulting from Impurities; 5.1. Impurity generating tensile stress (C); 5.2. Impurity generating compressive stress (Ge) 
505 8 |a 6. Externally Stressed SPEG6.1. Growth interface (in)stability and defectiveness; 6.2. Origins and driving forces; 7. Interaction of the Growth Interface with A SiOx Region; 7.1. Growth interface termination on one side; 7.2. Growth interface termination on two sides; 7.3. SiOx layer extent and growth interface pinning; 8. Defects Occurring at Mask Edges; 8.1. Typical mask-edge defect structure; 8.2. Simultaneous presence of stacking faults and perfect dislocations; 8.3. Growth interface templating and impingement; 8.4. Proximity of initial growth interface to wafer surface. 
590 |a Knovel  |b Knovel (All titles) 
650 0 |a Semiconductors  |x Defects. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
700 1 |a Romano, Lucia,  |d 1977-  |e editor. 
700 1 |a Privitera, Vittorio,  |e editor. 
700 1 |a Jagadish, C.  |q (Chennupati),  |e editor.  |1 https://id.oclc.org/worldcat/entity/E39PBJf8rtGMxrfJQDqDCqFkDq 
776 0 8 |i Print version:  |t Defects in semiconductors.  |b First edition.  |d Amsterdam, [Netherlands] : Academic Press, ©2015  |h xii, 445 pages  |k Semiconductors and semimetals ; Volume 91  |x 0080-8784  |z 9780128019351 
830 0 |a Semiconductors and semimetals ;  |v v. 91. 
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