Silicon-germanium (SiGe) nanostructures : production, properties and applications in electronics

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Bibliographic Details
Other Authors: Shiraki, Yasuhiro, 1942-, Usami, Noritaka.
Format: eBook
Language: English
Published: Cambridge, UK : Philadelphia, PA : Woodhead Pub., 2011.
Series: Woodhead Publishing in materials.
Subjects:
Nanostructured materials.
Silicon alloys.
Germanium alloys.
Electronic circuits.
Nanoelectronics.
elektronické knihy
electronic books
ISBN: 9781613443729
1613443722
0857091425
9780857091420
9781845696894
1845696891
Physical Description: 1 online resource (xx, 627 pages) : illustrations.

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LEADER 05392cam a2200481 a 4500
001 kn-ocn781711570
003 OCoLC
005 20240717213016.0
006 m o d
007 cr cn|||||||||
008 120327s2011 enka ob 001 0 eng d
040 |a KNOVL  |b eng  |e pn  |c KNOVL  |d OCLCQ  |d COO  |d ZCU  |d DEBSZ  |d OCLCQ  |d YDXCP  |d OCLCO  |d E7B  |d KNOVL  |d REB  |d N$T  |d OCLCF  |d OPELS  |d KNOVL  |d VT2  |d OTZ  |d OCLCQ  |d BUF  |d OCLCO  |d U3W  |d D6H  |d OCLCO  |d CEF  |d RRP  |d AU@  |d OCLCO  |d ESU  |d WYU  |d YOU  |d DCT  |d OCLCO  |d S2H  |d OCLCO  |d BRF  |d OCLCO  |d UPM  |d OCLCO  |d OCLCQ  |d OCLCO  |d OCLCL  |d OCLCQ  |d OCLCL  |d SXB 
020 |a 9781613443729  |q (electronic bk.) 
020 |a 1613443722  |q (electronic bk.) 
020 |a 0857091425  |q (electronic bk.) 
020 |a 9780857091420  |q (electronic bk.) 
020 |z 9781845696894 
020 |z 1845696891 
035 |a (OCoLC)781711570  |z (OCoLC)809166597  |z (OCoLC)827454883  |z (OCoLC)875200251  |z (OCoLC)961887860  |z (OCoLC)988638894  |z (OCoLC)999539731  |z (OCoLC)1026469174  |z (OCoLC)1058109047  |z (OCoLC)1065913127 
245 0 0 |a Silicon-germanium (SiGe) nanostructures :  |b production, properties and applications in electronics /  |c edited by Yasuhiro Shiraki and Noritaka Usami. 
260 |a Cambridge, UK :  |b Philadelphia, PA :  |b Woodhead Pub.,  |c 2011. 
300 |a 1 online resource (xx, 627 pages) :  |b illustrations. 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
490 1 |a Woodhead Publishing in materials 
504 |a Includes bibliographical references and index. 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty 
520 8 |a Annotation  |b Nanostructured silicon-germanium (SiGe) opens up the prospects of novel and enhanced electronic device performance, especially for semiconductor devices. Silicon-germanium (SiGe) nanostructuresreviews the materials science of nanostructures and their properties and applications in different electronic devices. The introductory part one covers the structural properties of SiGe nanostructures, with a further chapter discussing electronic band structures of SiGe alloys. Part two concentrates on the formation of SiGe nanostructures, with chapters on different methods of crystal growth such as molecular beam epitaxy and chemical vapor deposition. This part also includes chapters covering strain engineering and modeling. Part three covers the material properties of SiGe nanostructures, including chapters on such topics as strain-induced defects, transport properties and microcavities and quantum cascade laser structures. In Part four, chapters cover ultra large scale integrated applications, MOSFETs and the use of SiGe in different types of transistors and optical devices --  |c Source other than Library of Congress. 
505 0 |a Part 1 Introduction: Structural properties of silicon-germanium (SiGe) nanostructures -- Electronic band structures of SiGe alloys. Part 2 Formation of nanostructures: Understanding crystal growth mechanisms in SiGe nanostructures -- Types of SiGe bulk crystal growth methods and their applications -- SiGe crystal growth using molecular beam epitaxy -- SiGe crystal growth using chemical vapour deposition -- Strain engineering of SiGe virtual substrates -- Formation of silicon-germanium-on-insulator (SGOI)substrates -- Miscellaneous methods and materials for SiGe based heterostructures -- Modelling the evolution of germanium islands on silicon(001) thin films -- Strain engineering of SiGe micro- and nanostructures. Part 3 Material properties of SiGe nanostructures: Self-diffusion and dopant diffusion in germanium (Ge) and SiGe alloys -- Dislocations and other strain-induced defects in SiGe nanostructures -- Transport properties of SiGe nanostructures at low temperatures -- Transport properties of SiGe nanostructures and applications in devices -- Microcavities and quantum cascade laser structures based on SiGe nanostructures -- Silicide and germanide technology for interconnections in ultra large scale integrated (ULSI) applications. Part 4 Devices using Si, Ge and SiGe alloys: SiGe heterojunction bipolar transistor (HBT) and bipolar complementary metal oxide semiconductor (BiCMOS) technologies -- SiGe-based field effect transistors (FET) and complementary metal oxide semiconductor (CMOS) technologies -- High electron mobility germanium (Ge) metal oxide semiconductor field effect transistors (MOSFETs) -- Silicon (Si) and germanium (Ge) in optical devices -- Spintronics of nanostructured MnGe dilute magnetic semiconductor. 
590 |a Knovel  |b Knovel (All titles) 
650 0 |a Nanostructured materials. 
650 0 |a Silicon alloys. 
650 0 |a Germanium alloys. 
650 0 |a Electronic circuits. 
650 0 |a Nanoelectronics. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
700 1 |a Shiraki, Yasuhiro,  |d 1942-  |1 https://id.oclc.org/worldcat/entity/E39PCjyvC7668PWJRqBWhG9QRq 
700 1 |a Usami, Noritaka. 
776 0 8 |i Print version:  |t Silicon-germanium (SiGe) nanostructures.  |d Cambridge, UK : Philadelphia, PA : Woodhead Pub., 2011  |z 9781845696894  |w (OCoLC)666239787 
830 0 |a Woodhead Publishing in materials. 
856 4 0 |u https://proxy.k.utb.cz/login?url=https://app.knovel.com/hotlink/toc/id:kpSGSGNPP2/silicon-germanium-sige?kpromoter=marc  |y Full text 

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