ISTFA 2011 : conference proceedings from the 37th International Symposium for Testing and Failure Analysis, November 13-17, 2011, San Jose Convention Center, San Jose, California

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Bibliographic Details
Corporate Authors: International Symposium for Testing and Failure Analysis San Jose, Calif.), Electronic Device Failure Analysis Society., International Symposium for Testing and Failure Analysis/2011., ASM International.
Format: eBook
Language: English
Published: Materials Park, OH : ASM International, 2011.
Subjects:
ISBN: 9781615038503
1615038507
9781680155112
1680155113
9781615038268
1615038264
0615038264
Physical Description: 1 online resource (xix, 456 pages) : illustrations

Cover

Table of contents

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111 2 |a International Symposium for Testing and Failure Analysis  |n (37th :  |d 2011 :  |c San Jose, Calif.) 
245 1 0 |a ISTFA 2011 :  |b conference proceedings from the 37th International Symposium for Testing and Failure Analysis, November 13-17, 2011, San Jose Convention Center, San Jose, California /  |c sponsored by EDFAS, ISTFA/2011, ASM International. 
246 3 |a International Symposium for Testing and Failure Analysis 2011 
246 3 0 |a Conference proceedings of the 37th International Symposium for Testing and Failure Analysis 
246 3 0 |a 37th International Symposium for Testing and Failure Analysis 
246 3 |a Thirty-seventh International Symposium for Testing and Failure Analysis 
260 |a Materials Park, OH :  |b ASM International,  |c 2011. 
300 |a 1 online resource (xix, 456 pages) :  |b illustrations 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
500 |a Some online versions lack accompanying media packaged with the printed version. 
504 |a Includes bibliographical references and index. 
505 0 |a Title Page -- Copyright -- Contents -- IPFA 2011 Best Paper -- Electrical Failure and Damage Analysis of Multi-layer Metal Films on Flexible Substrate during Cyclic Bending Deformation -- Session 1: Emerging FA Techniques and Concepts -- A Position-Sensitive, Single-Photon Detector with Enhanced NIR Response -- Advanced Scan Chain Failure Analysis Using Laser Modulation Mapping and Continuous Wave Probing -- Thermal Frequency Imaging: A new application of Laser Voltage Imaging applied on 40nm technology 
505 8 |a Local Lattice Strain Measurement using Geometric Phase Analysis of Dark Field Images from Scanning Transmission Electron MicroscopyCorrecting for spherical aberrations in solid immersion microscopy using a deformable mirror -- Session 2: Circuit Edit -- The Challenges of Backside Focused Ion Beam (FIB) Editing in the Presence of Deep Trench Decoupling Capacitors -- State of the Art Substrate Manipulation As a Tool for Enhancing Product Performance -- Neon Ion Microscope Nanomachining Considerations 
505 8 |a Instant Solid Immersion Lens creation in silicon with a Focused Ion Beam- comparing refractive and diffractive methodsCircuit Edit and Optical Probe Development and Validation for Next Generation Process Nodes -- Session 3: Packaging and Assembly Level FA I -- 3DIC Fault Isolation Using the OBIRCH Approach -- Improving Wire Sweep Performance by Measuring Degree of Cure of Epoxy Mold Compounds -- Use of Lock-In Thermography for Non-Destructive 3D Defect Localization on System in Package and Stacked-Die Technology 
505 8 |a Quantitative Phase Shift Analysis for 3D Defect Localization Using Lock-in ThermographyFailure Analysis of Flip Chip C4 Package Using Focused Ion Beam Milling Technique -- Session 4: Test and Diagnostics -- Layout-aware Diagnosis Leads to Efficient and Effective Physical Failure Analysis -- Device Selection for Failure Analysis of Chain Fails Using Diagnosis Driven Yield Analysis -- Debugging an Invisible Flaky Scan Chain Defect -- Diagnose Compound Hold Time Faults Caused by Spot Delay Defects at Clock Tree -- Session 5: Defect Characterization and Metrology 
505 8 |a A Comprehensive Analysis Methodology for Gate Oxide Integrity Failure Using Combined FA TechniquesAl Bondpads, Halogens, and an ESCA-based Search for the Invisible Cause of Poor Throughput at Wafer Probe -- Whisker Formation in Copper Electroplating -- Comprehensive nano-structural approach of SSRM nanocontact on siliconthrough TEM-STEM study -- Highly Automated Transmission Electron Microscopy Tomography for Defect Understanding -- Transmission Electron Microscopy Characterization of FinFET â€? Understanding the 3D Structure by 2D Imaging Technique 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty 
590 |a Knovel  |b Knovel (All titles) 
650 0 |a Electronics  |x Materials  |x Testing  |v Congresses. 
650 0 |a Electronic apparatus and appliances  |x Testing  |v Congresses. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
710 2 |a Electronic Device Failure Analysis Society. 
710 2 |a International Symposium for Testing and Failure Analysis/2011. 
710 2 |a ASM International. 
776 0 8 |i Print version:  |a International Symposium for Testing and Failure Analysis (37th : 2011 : San Jose, Calif.).  |t ISTFA 2011.  |d Materials Park, OH : ASM International, 2011  |z 9781615038268  |w (OCoLC)769470020 
856 4 0 |u https://proxy.k.utb.cz/login?url=https://app.knovel.com/hotlink/toc/id:kpISTFAC0T/istfa-2011-conference?kpromoter=marc  |y Full text