Fabrication engineering at the micro and nanoscale

Saved in:
Bibliographic Details
Main Author: Campbell, Stephen A., 1954-
Format: eBook
Language: English
Published: New York : Oxford University Press, 2008.
Edition: 3rd ed.
Series: Oxford series in electrical and computer engineering.
Subjects:
ISBN: 9781613441107
161344110X
9780195320176
0195320174
Physical Description: 1 online resource (xiv, 647 pages) : illustrations

Cover

Table of contents

LEADER 03021cam a2200457 a 4500
001 kn-ocn743217551
003 OCoLC
005 20240717213016.0
006 m o d
007 cr cn|||||||||
008 110728s2008 nyua ob 001 0 eng d
040 |a KNOVL  |b eng  |e pn  |c KNOVL  |d OCLCQ  |d DEBSZ  |d OCLCQ  |d KNOVL  |d ZCU  |d KNOVL  |d OCLCF  |d OCLCO  |d COO  |d KNOVL  |d CNNAI  |d OCLCQ  |d VT2  |d UAB  |d BUF  |d OCLCQ  |d CEF  |d RRP  |d AU@  |d WYU  |d YOU  |d OCLCQ  |d ERF  |d OCLCO  |d OCLCQ  |d OCL  |d OCLCO  |d OCLCL  |d OCLCQ  |d OCLCL  |d SXB 
020 |a 9781613441107  |q (electronic bk.) 
020 |a 161344110X  |q (electronic bk.) 
020 |a 9780195320176  |q (pbk. ;  |q alk. paper) 
020 |a 0195320174  |q (pbk. ;  |q alk. paper) 
024 8 |a 99938605354 
035 |a (OCoLC)743217551  |z (OCoLC)748339450  |z (OCoLC)858447343  |z (OCoLC)961884888  |z (OCoLC)988635253  |z (OCoLC)999445003  |z (OCoLC)1058076207  |z (OCoLC)1065708099 
100 1 |a Campbell, Stephen A.,  |d 1954-  |1 https://id.oclc.org/worldcat/entity/E39PCjtDFKkpbB3b4gQPmjTPwC 
245 1 0 |a Fabrication engineering at the micro and nanoscale /  |c Stephen A. Campbell. 
250 |a 3rd ed. 
260 |a New York :  |b Oxford University Press,  |c 2008. 
300 |a 1 online resource (xiv, 647 pages) :  |b illustrations 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
490 1 |a The Oxford series in electrical and computer engineering 
504 |a Includes bibliographical references and index. 
505 0 |a An introduction to microelectronic fabrication -- Semiconductor substrates -- Diffusion -- Thermal Oxidation -- Ion Implantation -- Rapid thermal processing -- Optical lithography -- Photoresists -- Nonoptical lithographic techniques -- Vacuum Science and plasmas -- Etching -- Physical deposition: evaporation and sputtering -- Chemical vapor deposition -- Epitaxial growth -- Device isolation, contacts, and metalization -- CMOS technologies -- Other transistor technologies -- Optoelectronic technologies -- MEMS -- Integrated circuit manufacturing. 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty 
590 |a Knovel  |b Knovel (All titles) 
650 0 |a Semiconductors  |x Design and construction. 
650 0 |a Semiconductors  |x Mathematical models. 
650 0 |a Microelectronics. 
650 0 |a Nanoelectronics. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
700 1 |a Campbell, Stephen A.,  |d 1954-  |t Science and engineering of microelectronic fabrication. 
776 0 8 |i Print version:  |a Campbell, Stephen A., 1954-  |t Fabrication engineering at the micro and nanoscale.  |b 3rd ed.  |d New York : Oxford University Press, 2008  |z 0195320174  |w (DLC) 2007013450  |w (OCoLC)122338108 
830 0 |a Oxford series in electrical and computer engineering. 
856 4 0 |u https://proxy.k.utb.cz/login?url=https://app.knovel.com/hotlink/toc/id:kpFEMNE001/fabrication-engineering-at?kpromoter=marc  |y Full text