Lithography process control

This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process...

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Bibliographic Details
Main Author: Levinson, Harry J.
Format: eBook
Language: English
Published: Bellingham, Wash. : SPIE Optical Engineering Press, ©1999.
Series: Tutorial texts in optical engineering ; v. TT 28.
Subjects:
Semiconductors > Etching.
Microlithography > Quality control.
elektronické knihy
electronic books
ISBN: 9781615837366
1615837361
9780819478559
0819478555
9780819430526
0819430528
Physical Description: 1 online resource (x, 190 pages) : illustrations

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Summary: This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines.
Bibliography: Includes bibliographical references (pages 169-188) and index.
ISBN: 9781615837366
1615837361
9780819478559
0819478555
9780819430526
0819430528
Access: Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty

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