Resolution enhancement techniques in optical lithography

Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolutio...

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Bibliographic Details
Main Author Wong, Alfred Kwok-Kit
Format Electronic eBook
LanguageEnglish
Published Bellingham, Wash. : SPIE Press, ©2001.
SeriesTutorial texts in optical engineering ; v. TT 47.
Subjects
Integrated circuits > Design and construction.
Microlithography.
elektronické knihy
electronic books
Online AccessFull text
ISBN9781615837328
1615837329
9780819478818
0819478814
0819439959
9780819439956
Physical Description1 online resource (xvii, 214 pages) : illustrations

Cover

Table of Contents:
  • Foreword
  • Preface-- List of symbols
  • 1. Introduction. 1.1 Brief history of printing and lithography. 1.2 Optical lithography and integrated circuits. 1.3 Basics of optical lithography. 1.4 Requirements of microlithography. 1.5 Nonoptical microlithography techniques. 1.6 Current challenges of optical microlithography. 1.7 Three parameters affecting resolution. 1.8 Scope of discussion
  • 2. Optical imaging and resolution. 2.1 Coherent imaging. 2.2 Mask spectrum. 2.3 Partially coherent imaging. 2.4 Complex degree of coherence. 2.5 Rayleigh's resolution limit. 2.6 Lithography resolution limit. 2.7 Quantification of image quality.
  • 3. Modified illumination. 3.1 Partial coherence factor. 3.2 Off-axis illumination. 3.3 General guidelines
  • 4. Optical proximity correction. 4.1 Image distortion. 4.2 Optical proximity correction approaches. 4.3 Numerical techniques. 4.4 Implementation. 4.5 Discussion
  • 5. Alternating phase-shifting mask. 5.1 Principle. 5.2 Mask making process. 5.3 Issues. 5.4 Implementation. 5.5 Summary
  • 6. Attenuated phase-shift mask. 6.1 Principle. 6.2 Mask making. 6.3 Discussion
  • 7. Selecting appropriate RETs. 7.1 Critical levels. 7.2 Methodology. 7.3 Optimization results. 7.4 Summary and discussion
  • 8 Second-Generation RETs. 8.1 Multiple exposure. 8.2 Pupil filtering. 8.3 Advanced illumination scheme. 8.4 Compensating process. 8.5 Mask and photoresist tone
  • Concluding remarks
  • k1 conversion charts
  • Bibliography
  • Index.

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