Resolution enhancement techniques in optical lithography

Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolutio...

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Bibliographic Details
Main Author: Wong, Alfred Kwok-Kit.
Format: eBook
Language: English
Published: Bellingham, Wash. : SPIE Press, ©2001.
Series: Tutorial texts in optical engineering ; v. TT 47.
Subjects:
Integrated circuits > Design and construction.
Microlithography.
elektronické knihy
electronic books
ISBN: 9781615837328
1615837329
9780819478818
0819478814
0819439959
9780819439956
Physical Description: 1 online resource (xvii, 214 pages) : illustrations

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Summary: Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers.
Bibliography: Includes bibliographical references (pages 189-208) and index.
ISBN: 9781615837328
1615837329
9780819478818
0819478814
0819439959
9780819439956
Access: Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty

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