Developments in surface contamination and cleaning : particle deposition, control and removal
Saved in:
| Other Authors | , |
|---|---|
| Format | Electronic eBook |
| Language | English |
| Published |
Amsterdam ; Boston :
Elsevier/William Andrew,
©2010.
|
| Subjects | |
| Online Access | Full text |
| ISBN | 9781437778311 1437778313 9781437778304 1437778305 |
| Physical Description | 1 online resource (xv, 286 pages, 8 pages of plates) : illustrations (some color) |
| LEADER | 00000cam a2200000 a 4500 | ||
|---|---|---|---|
| 001 | kn-ocn670499524 | ||
| 003 | OCoLC | ||
| 005 | 20240717213016.0 | ||
| 006 | m o d | ||
| 007 | cr cn||||||||| | ||
| 008 | 101019s2010 ne af ob 001 0 eng d | ||
| 040 | |a KNOVL |b eng |e pn |c KNOVL |d DEBSZ |d CEF |d OCLCQ |d GA0 |d OCLCQ |d KNOVL |d OCLCA |d ZCU |d KNOVL |d B24X7 |d DA$ |d IDEBK |d OCLCQ |d GBVCP |d PHUST |d LIP |d OCLCQ |d OCLCA |d OCLCF |d RRP |d OCLCA |d OCLCO |d OCLCQ |d ESU |d OCLCO |d OCLCQ |d OCLCL |d SXB | ||
| 020 | |a 9781437778311 |q (electronic bk.) | ||
| 020 | |a 1437778313 |q (electronic bk.) | ||
| 020 | |a 9781437778304 | ||
| 020 | |a 1437778305 | ||
| 035 | |a (OCoLC)670499524 |z (OCoLC)694511711 |z (OCoLC)765134496 |z (OCoLC)823847451 |z (OCoLC)823917313 |z (OCoLC)824101467 |z (OCoLC)824159417 |z (OCoLC)837786437 | ||
| 245 | 0 | 0 | |a Developments in surface contamination and cleaning : |b particle deposition, control and removal / |c edited by Rajiv Kohli and Kashmiri L. Mittal. |
| 246 | 3 | 0 | |a Particle deposition, control and removal |
| 260 | |a Amsterdam ; |a Boston : |b Elsevier/William Andrew, |c ©2010. | ||
| 300 | |a 1 online resource (xv, 286 pages, 8 pages of plates) : |b illustrations (some color) | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 504 | |a Includes bibliographical references and index. | ||
| 505 | 0 | |a Particle Deposition onto Enclosure Surfaces; Contamination Control: A Systems Approach; Particles in Semiconductor Processing; Continuous Contamination Monitoring Systems; Strippable Coatings for Removal of Surface Contaminants; Ultrasonic Cleaning. | |
| 505 | 0 | |a [V. 1.] Fundamentals and applied aspects -- v. 2. Particle deposition, control and removal. | |
| 506 | |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty | ||
| 590 | |a Knovel |b Knovel (All titles) | ||
| 650 | 0 | |a Surfaces (Technology) | |
| 650 | 0 | |a Surface contamination |x Prevention. | |
| 650 | 0 | |a Particles |x Measurement. | |
| 650 | 0 | |a Cleaning. | |
| 650 | 0 | |a Coatings. | |
| 650 | 0 | |a Dust control. | |
| 655 | 7 | |a elektronické knihy |7 fd186907 |2 czenas | |
| 655 | 9 | |a electronic books |2 eczenas | |
| 700 | 1 | |a Kohli, Rajiv, |d 1947- | |
| 700 | 1 | |a Mittal, K. L., |d 1945- | |
| 776 | 0 | 8 | |i Print version: |t Developments in surface contamination and cleaning. |d Amsterdam ; Boston : Elsevier/William Andrew, ©2010 |z 9781437778304 |w (OCoLC)496230957 |
| 856 | 4 | 0 | |u https://proxy.k.utb.cz/login?url=https://app.knovel.com/hotlink/toc/id:kpDSCCPDC5/developments-in-surface?kpromoter=marc |y Full text |