Handbook of physical vapor deposition (PVD) processing

This updated version of the popular handbook further explains all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the ne...

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Bibliographic Details
Main Author Mattox, D. M.
Format Electronic eBook
LanguageEnglish
Published Norwich, N.Y. : Oxford : William Andrew ; Elsevier Science [distributor], ©2010.
Edition2nd ed.
Subjects
Physical vapor deposition > Handbooks, manuals, etc.
elektronické knihy
electronic books
Online AccessFull text
ISBN9780815520382
0815520387
9780815520375
0815520379
Physical Description1 online resource

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Table of Contents:
  • Substrate ("Real") Surfaces and Surface Modification
  • The "Good" Vacuum (Low Pressure) Processing Environment
  • The Sub-Atmospheric Processing Environments
  • The Low-Pressure Plasma Processing Environment
  • Vacuum Evaporation and Vacuum Deposition
  • Physical Sputtering and Sputter Deposition (Sputtering)
  • Arc Vapor Deposition
  • Ion Plating and Ion Beam Assisted Deposition
  • Atomistic Film Growth and Some Growth-Related Film Properties
  • Film Characterization and Some Basic Film Properties
  • Adhesion and Deadhesion
  • Cleaning
  • External Processing Environment
  • Transfer of Technology from R & D to Manufacturing.

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