Chemical vapour deposition : precursors, processes and applications

• Other Authors: Jones, Anthony C., Hitchman, Michael L.
• Format: Electronic eBook
• Language: English
• Published: Cambridge, UK : Royal Society of Chemistry, ©2009.
• Subjects: Chemical vapor deposition.; elektronické knihy; electronic books
• ISBN: 9781847558794; 1847558798; 9781621987031; 1621987035; 0854044655; 9780854044658
• Physical Description: 1 online resource (xv, 582 pages) : illustrations, plans

Chemical Vapour Deposition (CVD) involves the deposition of thin solid films from chemical precursors in the vapour phase, and encompasses a variety of deposition techniques, including a range of thermal processes, plasma enhanced CVD (PECVD), photon- initiated CVD, and atomic layer deposition (ALD)...

Table of Contents:

• 9780854044658; i_iv; v_vi; vii_xvi; 001_036; 037_092; 093_157; 158_206; 207_271; 272_319; 320_356; 357_412; 413_450; 451_476; 477_493; 494_534; 535_570; 571_582