Chemical vapour deposition : precursors, processes and applications

Chemical Vapour Deposition (CVD) involves the deposition of thin solid films from chemical precursors in the vapour phase, and encompasses a variety of deposition techniques, including a range of thermal processes, plasma enhanced CVD (PECVD), photon- initiated CVD, and atomic layer deposition (ALD)...

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Bibliographic Details
Other Authors: Jones, Anthony C., Hitchman, Michael L.
Format: eBook
Language: English
Published: Cambridge, UK : Royal Society of Chemistry, ©2009.
Subjects:
Chemical vapor deposition.
elektronické knihy
electronic books
ISBN: 9781847558794
1847558798
9781621987031
1621987035
0854044655
9780854044658
Physical Description: 1 online resource (xv, 582 pages) : illustrations, plans

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Table of contents

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020 |a 1847558798  |q (electronic bk.) 
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020 |a 1621987035  |q (electronic bk.) 
020 |a 0854044655  |q (hbk.) 
020 |a 9780854044658  |q (hbk.) 
020 |z 9780854044658  |q (hbk.) 
035 |a (OCoLC)319518113  |z (OCoLC)300197123  |z (OCoLC)961845520  |z (OCoLC)988712254  |z (OCoLC)999447512  |z (OCoLC)1065843011  |z (OCoLC)1086976725  |z (OCoLC)1102277406  |z (OCoLC)1116923651  |z (OCoLC)1155117197  |z (OCoLC)1157028344  |z (OCoLC)1391809880  |z (OCoLC)1410734675 
245 0 0 |a Chemical vapour deposition :  |b precursors, processes and applications /  |c edited by Anthony C. Jones, Michael L. Hitchman. 
246 3 |a Chemical vapor deposition 
260 |a Cambridge, UK :  |b Royal Society of Chemistry,  |c ©2009. 
300 |a 1 online resource (xv, 582 pages) :  |b illustrations, plans 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
504 |a Includes bibliographical references and index. 
505 0 |a 9780854044658; i_iv; v_vi; vii_xvi; 001_036; 037_092; 093_157; 158_206; 207_271; 272_319; 320_356; 357_412; 413_450; 451_476; 477_493; 494_534; 535_570; 571_582 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty 
520 |a Chemical Vapour Deposition (CVD) involves the deposition of thin solid films from chemical precursors in the vapour phase, and encompasses a variety of deposition techniques, including a range of thermal processes, plasma enhanced CVD (PECVD), photon- initiated CVD, and atomic layer deposition (ALD). The development of CVD technology owes a great deal to collaboration between different scientific disciplines such as chemistry, physics, materials science, engineering and microelectronics, and the publication of this book will promote and stimulate continued dialogue between scientists from thes. 
590 |a Knovel  |b Knovel (All titles) 
650 0 |a Chemical vapor deposition. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
700 1 |a Jones, Anthony C. 
700 1 |a Hitchman, Michael L. 
776 0 8 |i Print version:  |t Chemical vapour deposition.  |d Cambridge, UK : Royal Society of Chemistry, ©2009  |z 9780854044658  |w (DLC) 2009419379  |w (OCoLC)244653597 
856 4 0 |u https://proxy.k.utb.cz/login?url=https://app.knovel.com/hotlink/toc/id:kpCVDPPA04/chemical-vapour-deposition?kpromoter=marc  |y Full text 

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