Chemical vapour deposition : precursors, processes and applications

• Other Authors: Jones, Anthony C., Hitchman, Michael L.
• Format: eBook
• Language: English
• Published: Cambridge, UK : Royal Society of Chemistry, ©2009.
• Subjects: Chemical vapor deposition.; elektronické knihy; electronic books
• ISBN: 9781847558794; 1847558798; 9781621987031; 1621987035; 0854044655; 9780854044658
• Physical Description: 1 online resource (xv, 582 pages) : illustrations, plans
• Access: Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty

Chemical Vapour Deposition (CVD) involves the deposition of thin solid films from chemical precursors in the vapour phase, and encompasses a variety of deposition techniques, including a range of thermal processes, plasma enhanced CVD (PECVD), photon- initiated CVD, and atomic layer deposition (ALD). The development of CVD technology owes a great deal to collaboration between different scientific disciplines such as chemistry, physics, materials science, engineering and microelectronics, and the publication of this book will promote and stimulate continued dialogue between scientists from thes.