Frozen ground engineering

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Bibliographic Details
Main Author: Andersland, Orlando B.
Other Authors: Ladanyi, Branko.
Format: eBook
Language: English
Published: Hoboken, N.J. : [Place of publication not identified] : Wiley ; American Society of Civil Engineers, ©2004.
Edition: 2nd ed.
Subjects:
ISBN: 9781601192905
1601192908
9780471615491
0471615498
Physical Description: 1 online resource (xii, 363 pages) : illustrations, maps

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Table of contents

LEADER 03128cam a2200409 a 4500
001 kn-ocn173310762
003 OCoLC
005 20240717213016.0
006 m o d
007 cr cn|||||||||
008 070926s2004 njuab ob 001 0 eng d
040 |a KNOVL  |b eng  |e pn  |c KNOVL  |d CEF  |d OCLCQ  |d KNOVL  |d ZCU  |d KNOVL  |d OCLCF  |d OCLCQ  |d B24X7  |d OCLCQ  |d ERL  |d COO  |d KNOVL  |d OCLCQ  |d RRP  |d OCLCQ  |d AU@  |d WYU  |d OCLCQ  |d S9I  |d OCLCQ  |d ERF  |d UKBTH  |d LUN  |d EYM  |d OCLCQ  |d OCLCO  |d OCLCQ  |d ESU  |d OCLCO  |d OCLCL  |d SXB 
020 |a 9781601192905  |q (electronic bk.) 
020 |a 1601192908  |q (electronic bk.) 
020 |z 9780471615491 
020 |z 0471615498  |q (Cloth) 
035 |a (OCoLC)173310762  |z (OCoLC)810137400  |z (OCoLC)999666369  |z (OCoLC)1060197223  |z (OCoLC)1066605640  |z (OCoLC)1105916825  |z (OCoLC)1170259248  |z (OCoLC)1170704142  |z (OCoLC)1194749553 
100 1 |a Andersland, Orlando B. 
245 1 0 |a Frozen ground engineering /  |c Orlando B. Andersland, Branko Ladanyi. 
250 |a 2nd ed. 
260 |a Hoboken, N.J. :  |b Wiley ;  |a [Place of publication not identified] :  |b American Society of Civil Engineers,  |c ©2004. 
300 |a 1 online resource (xii, 363 pages) :  |b illustrations, maps 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
504 |a Includes bibliographical references (pages 333-349) and indexes. 
505 0 |a Glow discharge plasmas and sources for etching and deposition / Stephen M. Rossnagel -- Evaporation processes / Chandra Deshpandey and Rointan Bunshah -- Molecular beam epitaxy / Peter P. Chow -- Sputter deposition processes / Robert Parsons -- The cathodic arc plasma deposition of thin films / Philip C. Johnson -- Thermal chemical vapor deposition / Klavs F. Jensen and Werner Kern -- OMVPE of compound semiconductors / Thomas F. Kuech and Klavs F. Jensen -- Photochemical vapor deposition / J. Gary Eden -- Sol-gel coatings / Lisa C. Klein -- Plasma-enhanced chemical vapor deposition / Rafael Reif and Werner Kern -- Formation of inorganic films by remote plasma-enhanced chemical-vapor deposition / G. Lucovsky [and others] -- Selected area processing / Thomas M. Mayer and Susan D. Allen -- Plasma-assisted etching / Hans W. Lehmann. 
505 0 |a Ion beam etching / P. Reese Puckett, Stephen L. Michel, and William E. Hughes -- Laser-driven etching / Carol I.H. Ashby. 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty 
590 |a Knovel  |b Knovel (All titles) 
650 0 |a Frozen ground. 
650 0 |a Civil engineering  |x Cold weather conditions. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
700 1 |a Ladanyi, Branko. 
776 0 8 |i Print version:  |a Andersland, Orlando B.  |t Frozen ground engineering.  |b 2nd ed.  |d Hoboken, N.J. : Wiley ; [S.l.] : American Society of Civil Engineers, ©2004  |z 0471615498  |w (DLC) 2003017784  |w (OCoLC)52858339 
856 4 0 |u https://proxy.k.utb.cz/login?url=https://app.knovel.com/hotlink/toc/id:kpFGEE000S/frozen-ground-engineering?kpromoter=marc  |y Full text