Diamond chemical vapor deposition : nucleation and early growth stages

This book presents a systematic review of the latest developments in diamond CVD processes, with emphasis on the nucleation and early growth stages of diamond CVD. The objective is to familiarize the reader with the scientific and engineering aspects of diamond CVD, and to provide experienced resear...

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Bibliographic Details
Main Author: Liu, Huimin, 1961-
Other Authors: Dandy, David S.
Format: eBook
Language: English
Published: Park Ridge, N.J. : Noyes Publications, ©1995.
Series: Materials science and process technology series. Electronic materials and process technology.
Subjects:
Chemical vapor deposition.
Diamonds, Artificial.
elektronické knihy
electronic books
ISBN: 1591240433
9781591240433
9780815513803
0815513801
9780815516873
0815516878
9780080946184
0080946186
1282755099
9781282755093
9786612755095
6612755091
1282013823
9781282013827
9786612013829
6612013826
Physical Description: 1 online resource (xi, 195 pages) : illustrations

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Table of contents

LEADER 03845cam a2200589 a 4500
001 kn-ocm49708637
003 OCoLC
005 20240717213016.0
006 m o d
007 cr cn|||||||||
008 011105s1995 njua ob 001 0 eng d
040 |a KNOVL  |b eng  |e pn  |c KNOVL  |d OCLCQ  |d TEF  |d OCLCG  |d DEBSZ  |d OCLCQ  |d DEBBG  |d OCLCQ  |d KNOVL  |d OCLCO  |d VRC  |d OPELS  |d OCLCE  |d N$T  |d UWW  |d IDEBK  |d E7B  |d KNOVL  |d OCLCF  |d OCLCQ  |d COO  |d KNOVL  |d ZCU  |d YDXCP  |d OCLCQ  |d VT2  |d OCLCQ  |d BUF  |d D6H  |d CEF  |d RRP  |d AU@  |d OCLCO  |d WYU  |d ERF  |d OCLCQ  |d HS0  |d LEAUB  |d BRF  |d MM9  |d UAB  |d OCLCQ  |d OCLCO  |d COM  |d OCLCO  |d OCLCQ  |d COA  |d OCLCO  |d OCLCL  |d SXB 
020 |a 1591240433  |q (electronic bk.) 
020 |a 9781591240433  |q (electronic bk.) 
020 |a 9780815513803 
020 |a 0815513801 
020 |a 9780815516873  |q (electronic bk.) 
020 |a 0815516878  |q (electronic bk.) 
020 |a 9780080946184  |q (e-book) 
020 |a 0080946186  |q (e-book) 
020 |a 1282755099 
020 |a 9781282755093 
020 |a 9786612755095 
020 |a 6612755091 
020 |a 1282013823 
020 |a 9781282013827 
020 |a 9786612013829 
020 |a 6612013826 
024 8 |a (WaSeSS)ssj0000071730 
035 |a (OCoLC)49708637  |z (OCoLC)49270370  |z (OCoLC)281558178  |z (OCoLC)301965294  |z (OCoLC)605379625  |z (OCoLC)647802574  |z (OCoLC)648577107  |z (OCoLC)961879085  |z (OCoLC)988615954  |z (OCoLC)999545567  |z (OCoLC)1044330015  |z (OCoLC)1047752127  |z (OCoLC)1056383187  |z (OCoLC)1057966076  |z (OCoLC)1060854688  |z (OCoLC)1066049242  |z (OCoLC)1073083185  |z (OCoLC)1086425200  |z (OCoLC)1108951243  |z (OCoLC)1224452323  |z (OCoLC)1229063777  |z (OCoLC)1340067356 
042 |a dlr 
100 1 |a Liu, Huimin,  |d 1961-  |1 https://id.oclc.org/worldcat/entity/E39PCjFvypGJtyXkPG7tBKDJ8P 
245 1 0 |a Diamond chemical vapor deposition :  |b nucleation and early growth stages /  |c by Huimin Liu and David S. Dandy. 
260 |a Park Ridge, N.J. :  |b Noyes Publications,  |c ©1995. 
300 |a 1 online resource (xi, 195 pages) :  |b illustrations 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
490 1 |a Materials science and process technology series. Electronic materials and process technology 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty 
520 |a This book presents a systematic review of the latest developments in diamond CVD processes, with emphasis on the nucleation and early growth stages of diamond CVD. The objective is to familiarize the reader with the scientific and engineering aspects of diamond CVD, and to provide experienced researchers, scientists, and engineers in academics and industry with the latest developments in this growing field. 
504 |a Includes bibliographical references and index. 
505 0 |a General Introduction -- Atomic and Crystal Structures of Diamond -- Diamond CVD Techniques -- Diamond Nucleation Mechanisms -- Effects of Surface Conditions on Diamond Nucleation -- Effects of Deposition Conditions on Diamond Nucleation -- Theoretical and Modeling Studies on Diamond Nucleation -- References -- Index. 
590 |a Knovel  |b Knovel (All titles) 
650 0 |a Chemical vapor deposition. 
650 0 |a Diamonds, Artificial. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
700 1 |a Dandy, David S. 
776 0 8 |i Print version:  |a Liu, Huimin, 1961-  |t Diamond chemical vapor deposition.  |d Park Ridge, N.J. : Noyes Publications, ©1995  |z 0815513801  |w (DLC) 95030332  |w (OCoLC)32698652 
830 0 |a Materials science and process technology series.  |p Electronic materials and process technology. 
856 4 0 |u https://proxy.k.utb.cz/login?url=https://app.knovel.com/hotlink/toc/id:kpDCVD0005/diamond-chemical-vapor?kpromoter=marc  |y Full text 

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