Handbook of chemical vapor deposition : principles, technology, and applications

CVD technology has grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is...

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Bibliographic Details
Main Author Pierson, Hugh O.
Format Electronic eBook
LanguageEnglish
Published Norwich, N.Y. : Noyes Publications, 1999.
Edition2nd ed.
SeriesMaterials science and process technology series. Electronic materials and process technology.
Subjects
Vapor-plating > Handbooks, manuals, etc.
Chemical vapor deposition > Handbooks, manuals, etc.
elektronické knihy
electronic books
Online AccessFull text
ISBN1591240301
9781591240303
9780815517436
0815517432
9780815514329
0815514328
Physical Description1 online resource (xxiv, 482 pages) : illustrations

Cover

Table of Contents:
  • Introduction and General Considerations
  • Fundamentals of Chemical Vapor Deposition
  • The Chemistry of CVD
  • Metallo-Organic CVD (MOCVD)
  • CVD Processes and Equipment
  • The CVD of Metals
  • The CVD of the Allotropes of Carbon
  • The CVD of Non-Metallic Elements
  • The CVD of Ceramic Materials: Carbides
  • The CVD of Ceramic Materials: Nitrides
  • The CVD of Ceramic Materials: Oxides
  • The CVD of Ceramic Materials: Borides, Silicides, III-V Compounds and II-VI Compounds (Chalcogenides)
  • CVD in Electronic Applications: Semiconductors
  • CVD in Electronic Applications: Conductors, Insulators, and Diffusion Barriers
  • CVD in Optoelectronic and Ferroelectric Applications
  • CVD in Optical Applications
  • CVD in Wear- and Corrosion-Resistant Applications
  • CVD in Cutting-Tool Applications
  • CVD in Fiber, Powder, and Monolithic Applications
  • Conversion Guide
  • Appendix: Alternative Processes for Thin-Film Deposition and Surface Modification
  • Index.

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