Handbook of chemical vapor deposition : principles, technology, and applications

CVD technology has grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is...

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Bibliographic Details
Main Author: Pierson, Hugh O.
Format: eBook
Language: English
Published: Norwich, N.Y. : Noyes Publications, 1999.
Edition: 2nd ed.
Series: Materials science and process technology series. Electronic materials and process technology.
Subjects:
ISBN: 1591240301
9781591240303
9780815517436
0815517432
9780815514329
0815514328
Physical Description: 1 online resource (xxiv, 482 pages) : illustrations

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Table of contents

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100 1 |a Pierson, Hugh O. 
245 1 0 |a Handbook of chemical vapor deposition :  |b principles, technology, and applications /  |c by Hugh O. Pierson. 
250 |a 2nd ed. 
260 |a Norwich, N.Y. :  |b Noyes Publications,  |c 1999. 
300 |a 1 online resource (xxiv, 482 pages) :  |b illustrations 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
490 1 |a Materials science and process technology series. Electronic materials and process technology 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty 
520 |a CVD technology has grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Readers will find data on both Plasma CVD and metallo-organic CVD processes. The book also explains the growing importance of CVD in production of semiconductor and related applications. 
504 |a Includes bibliographical references and index. 
505 0 |a Introduction and General Considerations -- Fundamentals of Chemical Vapor Deposition -- The Chemistry of CVD -- Metallo-Organic CVD (MOCVD) -- CVD Processes and Equipment -- The CVD of Metals -- The CVD of the Allotropes of Carbon -- The CVD of Non-Metallic Elements -- The CVD of Ceramic Materials: Carbides -- The CVD of Ceramic Materials: Nitrides -- The CVD of Ceramic Materials: Oxides -- The CVD of Ceramic Materials: Borides, Silicides, III-V Compounds and II-VI Compounds (Chalcogenides) -- CVD in Electronic Applications: Semiconductors -- CVD in Electronic Applications: Conductors, Insulators, and Diffusion Barriers -- CVD in Optoelectronic and Ferroelectric Applications -- CVD in Optical Applications -- CVD in Wear- and Corrosion-Resistant Applications -- CVD in Cutting-Tool Applications -- CVD in Fiber, Powder, and Monolithic Applications -- Conversion Guide -- Appendix: Alternative Processes for Thin-Film Deposition and Surface Modification -- Index. 
590 |a Knovel  |b Knovel (All titles) 
650 0 |a Vapor-plating  |v Handbooks, manuals, etc. 
650 0 |a Chemical vapor deposition  |v Handbooks, manuals, etc. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
776 0 8 |i Print version:  |a Pierson, Hugh O.  |t Handbook of chemical vapor deposition.  |b 2nd ed.  |d Norwich, N.Y. : Noyes Publications, 1999  |z 0815514328  |w (DLC) 99026065  |w (OCoLC)41090758 
830 0 |a Materials science and process technology series.  |p Electronic materials and process technology. 
856 4 0 |u https://proxy.k.utb.cz/login?url=https://app.knovel.com/hotlink/toc/id:kpHCVDCVD4/handbook-of-chemical?kpromoter=marc  |y Full text