Handbook of VLSI microlithography : principles, technology, and applications

This handbook gives readers a look at the technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings - including optical lithography, electron beam, ion beam, and X-ray lithography. The book's main theme is the specia...

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Bibliographic Details
Other Authors Helbert, John N.
Format Electronic eBook
LanguageEnglish
Published Park Ridge, N.J. : Norwich, N.Y. : Noyes Publications ; William Andrew Pub., ©2001.
Edition2nd ed.
SeriesMaterials science and process technology series. Electronic materials and process technology.
Subjects
Integrated circuits > Very large scale integration.
Microlithography.
elektronické knihy
electronic books
Online AccessFull text
ISBN1591242754
9781591242758
9780815517801
0815517807
9786611411763
6611411763
9780815514442
0815514441
Physical Description1 online resource (xxi, 1001 pages) : illustrations

Cover

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245 0 0 |a Handbook of VLSI microlithography :  |b principles, technology, and applications /  |c edited by John N. Helbert. 
250 |a 2nd ed. 
260 |a Park Ridge, N.J. :  |b Noyes Publications ;  |a Norwich, N.Y. :  |b William Andrew Pub.,  |c ©2001. 
300 |a 1 online resource (xxi, 1001 pages) :  |b illustrations 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
490 1 |a Materials science and process technology series. Electronic materials and process technology 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty 
520 |a This handbook gives readers a look at the technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings - including optical lithography, electron beam, ion beam, and X-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge, and pattern feature dimension control. The book's explanation of resist and resist process equipment technology describes the relationship between the resist process and equipment parameters. The basics of resist technology are also covered - including an entire chapter on resist process defectivity and the potential yield limiting effect on device production. 
504 |a Includes bibliographical references and index. 
505 0 |a Issues and Trends Affecting Lithography Tool Selection Strategy -- Resist Technology: Design, Processing and Applications -- Lithography Process Monitoring and Defect Detection -- Techniques and Tools for Photo Metrology -- Techniques and Tools for Optical Lithography -- Microlithography Tool Automation -- Electron Beam ULSI Applications -- Rational Vibration and Structural Dynamics for Lithographic Tool Installations -- Applications of Ion Microbeam Lithography and Direct Processing -- X-Ray Lithography. 
590 |a Knovel  |b Knovel (All titles) 
650 0 |a Integrated circuits  |x Very large scale integration. 
650 0 |a Microlithography. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
700 1 |a Helbert, John N. 
776 0 8 |i Print version:  |t Handbook of VLSI microlithography.  |b 2nd ed.  |d Park Ridge, N.J. : Noyes Publications ; Norwich, N.Y. : William Andrew Pub., ©2001  |z 0815514441  |w (DLC) 00028173  |w (OCoLC)43591143 
830 0 |a Materials science and process technology series.  |p Electronic materials and process technology. 
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