Principles of lithography
The publication of Principles of Lithography, Third Edition just five years after the previous edition is evidence of the quickly changing and exciting nature of lithography as applied to the production of integrated circuits and other micro- and nanoscale devices. This text is intended to serve as...
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Main Author: | |
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Format: | eBook |
Language: | English |
Published: |
Bellingham, Wash. :
SPIE Press,
©2010.
|
Edition: | 3rd ed. |
Series: | SPIE monograph ;
PM198. |
Subjects: | |
ISBN: | 9780819483256 9781628700107 9780819483249 |
Physical Description: | 1 online zdroj (xiv, 503 pages) : illustrations (some color). |
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100 | 1 | |a Levinson, Harry J. | |
245 | 1 | 0 | |a Principles of lithography |h [elektronický zdroj] / |c Harry J. Levinson. |
250 | |a 3rd ed. | ||
260 | |a Bellingham, Wash. : |b SPIE Press, |c ©2010. | ||
300 | |a 1 online zdroj (xiv, 503 pages) : |b illustrations (some color). | ||
336 | |a text |b txt |2 rdacontent | ||
337 | |a počítač |b c |2 rdamedia | ||
338 | |a online zdroj |b cr |2 rdacarrier | ||
490 | 1 | |a Press monograph ; |v 198 | |
504 | |a Includes bibliographical references and index. | ||
505 | 0 | |a Preface to the third edition -- Preface to the second edition -- Preface -- Chapter 1. Overview of lithography -- Chapter 2. Optical pattern formation -- Chapter 3. Photoresists -- Chapter 4. Modeling and thin-film effects -- Chapter 5. Wafer steppers -- Chapter 6. Overlay -- Chapter 7. Masks and reticles -- Chapter 8. Confronting the diffraction limit -- Chapter 9. Metrology -- Chapter 10. Immersion lithography and the limits of optical lithography -- Chapter 11. Lithography costs -- Chapter 12. Extreme ultraviolet lithography -- Chapter 13. Alternative lithography techniques -- Appendix A: Coherence. | |
520 | |a The publication of Principles of Lithography, Third Edition just five years after the previous edition is evidence of the quickly changing and exciting nature of lithography as applied to the production of integrated circuits and other micro- and nanoscale devices. This text is intended to serve as an introduction to the science of microlithography, but also covers several subjects in depth, making it useful to the experienced lithographer as well. Topics directly related to manufacturing tools are addressed, including overlay, the stages of exposure, tools, and light sources. This updated edition reflects recent advances in technology, including the shift of immersion lithography from development into volume manufacturing, and the movement of EUV lithography from the lab to development pilot lines. New references and homework problems are included. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus. | ||
590 | |a Knovel Library |b ACADEMIC - Optics & Photonics | ||
506 | |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty univerzity | ||
650 | 0 | |a Integrated circuits |x Design and construction. | |
650 | 0 | |a Microlithography. | |
655 | 7 | |a elektronické knihy |7 fd186907 |2 czenas | |
655 | 9 | |a electronic books |2 eczenas | |
776 | 0 | 8 | |i Print version: |a Levinson, Harry J. |t Principles of lithography. |b 3rd ed. |d Bellingham, Wash. : SPIE Press, ©2010 |z 9780819483249 |w (DLC) 2010026775 |w (OCoLC)647976639 |
830 | 0 | |a SPIE monograph ; |v PM198. | |
856 | 4 | 0 | |u https://proxy.k.utb.cz/login?url=http://app.knovel.com/hotlink/toc/id:kpPLE00005/principles_of_lithography_3rd_edition |y Plný text |
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