Optical scattering measurement and analysis

As the authoritative resource on optical scattering, this book was developed from many years of teaching light-scatter measurement and analysis courses to optical engineers. Dr. Stover covers scattering beginning with its basics and covering surface roughness calculations, measurements, instrumentat...

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Bibliographic Details
Main Author: Stover, John C.
Corporate Author: Society of Photo-optical Instrumentation Engineers.
Format: eBook
Language: English
Published: Bellingham, Wash., USA : SPIE Optical Engineering Press, c1995.
Edition: 2nd ed.
Series: SPIE monograph ; PM24.
Subjects:
Light > Scattering.
elektronické knihy
electronic books
ISBN: 9781615837397
9780819419347
9780819478443
9780819477767
Physical Description: 1 online zdroj (xiii, 321 p.) : ill.

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Table of contents

LEADER 05908cam a2200577 a 4500
001 81704
003 CZ ZlUTB
005 20240911221033.0
006 m o d
007 cr |n
008 110105s1995 waua sb 001 0 eng d
020 |a 9781615837397  |q (ebook) 
020 |a 9780819419347 
020 |a 9780819478443  |q (ebook) 
020 |z 9780819477767 
024 7 |a 10.1117/3.203079  |2 doi 
035 |a (OCoLC)695027107  |z (OCoLC)435971867 
040 |a KNOVL  |b eng  |c KNOVL  |d DEBSZ  |d OCLCQ  |d KNOVL  |d OCLCA  |d KNOVL  |d OCLCF  |d J2I  |d CEF  |d SPIES  |d EBLCP  |d E7B  |d COO  |d KNOVL  |d YDXCP 
100 1 |a Stover, John C. 
245 1 0 |a Optical scattering  |h [elektronický zdroj] :  |b measurement and analysis /  |c John C. Stover. 
250 |a 2nd ed. 
260 |a Bellingham, Wash., USA :  |b SPIE Optical Engineering Press,  |c c1995. 
300 |a 1 online zdroj (xiii, 321 p.) :  |b ill. 
336 |a text  |b txt  |2 rdacontent 
337 |a počítač  |b c  |2 rdamedia 
338 |a online zdroj  |b cr  |2 rdacarrier 
490 1 |a SPIE Press monograph ;  |v PM24 
504 |a Includes bibliographical references (p. 303-317) and index. 
520 |a As the authoritative resource on optical scattering, this book was developed from many years of teaching light-scatter measurement and analysis courses to optical engineers. Dr. Stover covers scattering beginning with its basics and covering surface roughness calculations, measurements, instrumentation, predictions, specifications, and industrial applications. Also included are appendices that review the basics of wave propagation and Kirchhoff diffraction. Whether you're an optical engineer currently investigating roughness-induced haze in the semiconductor industry, or just entering the field of scatter metrology, this text will be invaluable. 
505 0 |a Chapter 1. Introduction to light scatter: 1.1 The scattering of light -- 1.2 Scatter from a smooth sinusoidal surface -- 1.3 Scatter from other surfaces -- 1.4 Scatter from windows and particulates -- 1.5 Bidirectional scatter distribution functions -- 1.6 Total integrated scatter -- 1.7 Summary. 
505 8 |a Chapter 2. Surface roughness: 2.1 Profile characterization -- 2.2 The surface power spectral-- Density and autocovariance functions -- 2.3 Summary. 
505 8 |a Chapter 3. Scatter calculations and diffraction theory: 3.1. Overview -- 3.2. Kirchhoff diffraction theory -- 3.3. The Rayleigh approach -- 3.4. Comparison of vector and scalar results -- 3.5. Summary. 
505 8 |a Chapter 4. Calculation of smooth-surface statistics from the BRDF: 4.1. Practical application of the Rayleigh-Rice perturbation theory -- 4.2. Roughness statistics of isotropic surfaces -- 4.3. Roughness statistics of one-dimensional surfaces -- 4.4. Roughness statistics for the general case -- 4.5. The K-correlation surface power spectrum models -- 4.6. The TIS derivation from the Rayleigh-Rice perturbation theory -- 4.7. Summary. 
505 8 |a Chapter 5. Polarization of scattered light: 5.1. A review of polarization concepts -- 5.2. The polarization factor Q -- 5.3. Scattering vectors and matrices -- 5.4. Summary. 
505 8 |a Chapter 6. Scatter measurements and instrumentation: 6.1. Scatterometer components -- 6.2. Instrument signature -- 6.3. Aperture effects on the measured BSDF -- 6.4. Signature reduction and near-specular measurements -- 6.5. The noise-equivalent BSDF -- 6.6. Measurement of P. and instrument calibration -- 6.7. Measurement of curved optics -- 6.8. Coordinate systems and out-of-plane measurements -- 6.9. Raster scans -- 6.10. Measurement of retroreflection -- 6.11. Alternate TIS devices -- 6.12. Error analysis of the measured BSDF -- 6.13. Summary. 
505 8 |a Chapter 7. Scatter predictions: 7.1. Optical surfaces: using the Rayleigh-Rice equation -- 7.2. Rough surfaces -- 7.3. Partial data sets -- 7.4. Scatter from diffuse samples -- 7.5. BRDF standard surfaces -- 7.6. Software for prediction of scatter in optical systems -- 7.7. Summary. 
505 8 |a Chapter 8. Detection of Discrete Surface and Subsurface Defects: 8.1. Polarization effects associated with defect scatter -- 8.2. Bulk defects in transparent optics -- 8.3. Near-point-scatter sources and differential-scattering cross section -- 8.4. Nontopographic defects in opaque materials -- 8.5. Summary. 
505 8 |a Chapter 9. Industrial applications: 9.1 Semiconductor applications -- 9.2. Computer disks -- 9.3. Contamination measurement by wavelength discrimination -- 9.4. General manufacturing examples -- 9.5. Summary. 
505 8 |a Chapter 10. Scatter specifications: 10.1 Generic specifications -- 10.2. Calculation of specifications for several examples -- 10.3. Summary -- Appendix A. Review of electromagnetic wave propagation -- A. 1 The wave equation -- A.2 Electromagnetic plane waves in free space -- A.3 Plane waves in a dielectric -- A.4 Plane waves.in a conducting medium -- Appendix B. Kirchhoff diffraction from sinusoidal gratings -- Appendix C. BSDF data -- Bibliography -- Index. 
590 |a Knovel Library  |b ACADEMIC - Nanotechnology 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty univerzity 
650 0 |a Light  |x Scattering. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
710 2 |a Society of Photo-optical Instrumentation Engineers. 
776 0 8 |i Print version:  |a Stover, John C.  |t Optical scattering.  |b 2nd ed.  |d Bellingham, Wash., USA : SPIE Optical Engineering Press, c1995  |z 0819419346  |w (DLC) 95014620  |w (OCoLC)32346943 
830 0 |a SPIE monograph ;  |v PM24. 
856 4 0 |u https://proxy.k.utb.cz/login?url=http://app.knovel.com/hotlink/toc/id:kpOSMAE002/optical_scattering__measurement_and_analysis_2nd_edition  |y Plný text 
992 |a BK  |c KNOVEL 
999 |c 81704  |d 81704 
993 |x NEPOSILAT  |y EIZ 

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