Handbook of Thin-Film Deposition Processes and Techniques Principles, Methods, Equipment and Applications.
Annotation
Saved in:
| Main Author | |
|---|---|
| Format | eBook |
| Language | English |
| Published |
Burlington : Saint Louis :
Noyes Publications [Imprint] William Andrew, Inc. Elsevier Science & Technology Books [distributor]
Dec. 2001
|
| Edition | 2nd ed. |
| Series | Materials Science and Process Technology Ser.
|
| Subjects | |
| Online Access | Full text |
| ISBN | 9780815514428 |
| Physical Description | 1 online zdroj (430 p.) ill. |
Cover
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| 100 | 1 | |a Seshan, Krishna, |e Author. | |
| 245 | 1 | 0 | |a Handbook of Thin-Film Deposition Processes and Techniques |h [elektronický zdroj]: |b Principles, Methods, Equipment and Applications. |
| 250 | |a 2nd ed. | ||
| 260 | |b Noyes Publications [Imprint] |c Dec. 2001 |a Burlington : |b William Andrew, Inc. |a Saint Louis : |b Elsevier Science & Technology Books [distributor] | ||
| 300 | |a 1 online zdroj (430 p.) |b ill. | ||
| 490 | 1 | |a Materials Science and Process Technology Ser. | |
| 520 | 8 | |a Annotation |b This new edition traces the technology behind the growth in the silicon semiconductor industry and the continued trend in miniaturization, covering PVD, laser and E beam assisted deposition, MBE and ion beam methods. New chapters have been added on contamination and control, chemical mechanical polishing to attain the flatness required by modern lithography methods, new materials used for interconnect dielectric materials and meteorology. | |
| 521 | |a Scholarly & Professional |b William Andrew, Incorporated. | ||
| 590 | |a Knovel Library |b ACADEMIC - Electronics & Semiconductors | ||
| 506 | |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty univerzity | ||
| 655 | 7 | |a elektronické knihy |7 fd186907 |2 czenas | |
| 655 | 9 | |a electronic books |2 eczenas | |
| 830 | 0 | |a Materials Science and Process Technology Ser. | |
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