http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when taken together, Thin Film Processes II and its predecessor present a thorough grounding in modern thin film techniques. Key Features * Provides an all-new sequel to the 1978 classic, Thin Film Processes * Introduces new topics, and several key topics presented in the original volume are updated * Emphasizes practical applications of major thin film deposition and etching processes * Helps readers find the appropriate technology for a particular application.
Glow discharge plasmas and sources for etching and deposition / Stephen M. Rossnagel -- Evaporation processes / Chandra Deshpandey and Rointan Bunshah -- Molecular beam epitaxy / Peter P. Chow -- Sputter deposition processes / Robert Parsons -- The cathodic arc plasma deposition of thin films / Philip C. Johnson -- Thermal chemical vapor deposition / Klavs F. Jensen and Werner Kern -- OMVPE of compound semiconductors / Thomas F. Kuech and Klavs F. Jensen -- Photochemical vapor deposition / J. Gary Eden -- Sol-gel coatings / Lisa C. Klein -- Plasma-enhanced chemical vapor deposition / Rafael Reif and Werner Kern -- Formation of inorganic films by remote plasma-enhanced chemical-vapor deposition / G. Lucovsky ... [et al.] -- Selected area processing / Thomas M. Mayer and Susan D. Allen -- Plasma-assisted etching / Hans W. Lehmann.
Ion beam etching / P. Reese Puckett, Stephen L. Michel, and William E. Hughes -- Laser-driven etching / Carol I.H. Ashby.
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Includes bibliographical references and index.