rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Thin film processes II
  title info:
    title: Thin film processes two
  name:
    name part: Vossen, John L.
  name:
    name part: Kern, Werner
    name part: 1925-
  type of resource: text
  genre: bibliography
  genre: elektronické knihy
  genre: electronic books
  origin info:
    place:
      place term: mau
    place:
      place term: Boston
    publisher: Academic Press
    date issued: c1991
    date issued: 1991
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: electronic
    form: elektronický zdroj
    form: remote
    extent: 1 online zdroj (xiii, 866 p.) : ill.
  abstract: This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when taken together, Thin Film Processes II and its predecessor present a thorough grounding in modern thin film techniques. Key Features * Provides an all-new sequel to the 1978 classic, Thin Film Processes * Introduces new topics, and several key topics presented in the original volume are updated * Emphasizes practical applications of major thin film deposition and etching processes * Helps readers find the appropriate technology for a particular application.
  table of contents: Glow discharge plasmas and sources for etching and deposition / Stephen M. Rossnagel -- Evaporation processes / Chandra Deshpandey and Rointan Bunshah -- Molecular beam epitaxy / Peter P. Chow -- Sputter deposition processes / Robert Parsons -- The cathodic arc plasma deposition of thin films / Philip C. Johnson -- Thermal chemical vapor deposition / Klavs F. Jensen and Werner Kern -- OMVPE of compound semiconductors / Thomas F. Kuech and Klavs F. Jensen -- Photochemical vapor deposition / J. Gary Eden -- Sol-gel coatings / Lisa C. Klein -- Plasma-enhanced chemical vapor deposition / Rafael Reif and Werner Kern -- Formation of inorganic films by remote plasma-enhanced chemical-vapor deposition / G. Lucovsky ... [et al.] -- Selected area processing / Thomas M. Mayer and Susan D. Allen -- Plasma-assisted etching / Hans W. Lehmann.
  table of contents: Ion beam etching / P. Reese Puckett, Stephen L. Michel, and William E. Hughes -- Laser-driven etching / Carol I.H. Ashby.
  note: edited by John L. Vossen, Werner Kern.
  note: Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty univerzity
  note: Includes bibliographical references and index.
  subject:
    topic: Thin films
  related item:
    title info:
      title: Thin film processes ; 2
  related item:
    title info:
      title: Thin film processes II
    origin info:
      publisher: Boston : Academic Press, c1991
    identifier: (DLC) 90020758
    identifier: (OCoLC)22623928
  identifier: 9780080524214
  identifier: 9781601192905
  identifier: 9780127282510
  identifier: https://proxy.k.utb.cz/login
  access condition: Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty univerzity
  record info:
    record content source: KNOVL
    record creation date: 070620
    record change date: 20251006170703.0
    record identifier: 78884
    language of cataloging:
      language term: eng