Characterization in silicon processing

This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to disc...

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Bibliographic Details
Other Authors: Strausser, Yale.
Format: eBook
Language: English
Published: Boston : Greenwich : Butterworth-Heinemann ; Manning, ©1993.
Series: Materials characterization series.
Subjects:
Silicon.
Electric conductors.
Semiconductor films.
Surface chemistry.
elektronické knihy
electronic books
ISBN: 9781591245254
9780080523422
9780750691727
Physical Description: 1 online zdroj (xiii, 240 pages) : illustrations.

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Table of contents

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001 78846
003 CZ ZlUTB
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006 m o d
007 cr |n
008 030916s1993 maua sb 001 0 eng d
020 |a 9781591245254  |q (ebook) 
020 |a 9780080523422  |q (ebook) 
020 |z 9780750691727 
035 |a (OCoLC)53032668  |z (OCoLC)271043976  |z (OCoLC)468751568  |z (OCoLC)621201384  |z (OCoLC)638740532  |z (OCoLC)638740539 
040 |a KNOVL  |b eng  |e pn  |c KNOVL  |d TEF  |d OCLCQ  |d DEBSZ  |d OCLCQ  |d UMC  |d AU@  |d OCLCE  |d COO  |d KNOVL  |d ZCU  |d KNOVL  |d OCLCF  |d UIU  |d OPELS  |d N$T  |d OCLCQ  |d KNOVL  |d YDXCP 
245 0 0 |a Characterization in silicon processing  |h [elektronický zdroj] /  |c editor, Yale Strusser ; consulting editors, C.R. Brundle, Gary E. McGuire ; managing editor, Lee E. Fitzpatrick. 
260 |a Boston :  |b Butterworth-Heinemann ;  |a Greenwich :  |b Manning,  |c ©1993. 
300 |a 1 online zdroj (xiii, 240 pages) :  |b illustrations. 
336 |a text  |b txt  |2 rdacontent 
337 |a počítač  |b c  |2 rdamedia 
338 |a online zdroj  |b cr  |2 rdacarrier 
490 1 |a Materials characterization series 
504 |a Includes bibliographical references and index. 
520 |a This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to discuss typical problems seen throughout that films' history, including characterization tools which are most effectively used to clarifying and solving those problems. 
590 |a Knovel Library  |b ACADEMIC - Electronics & Semiconductors 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty univerzity 
650 0 |a Silicon. 
650 0 |a Electric conductors. 
650 0 |a Semiconductor films. 
650 0 |a Surface chemistry. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
700 1 |a Strausser, Yale. 
776 0 8 |i Print version:  |t Characterization in silicon processing.  |d Boston : Butterworth-Heinemann ; Greenwich : Manning, ©1993  |z 0750691727 
830 0 |a Materials characterization series. 
856 4 0 |u https://proxy.k.utb.cz/login?url=http://app.knovel.com/hotlink/toc/id:kpCSP00001/characterization_in_silicon_processing  |y Plný text 
992 |a BK  |c KNOVEL 
999 |c 78846  |d 78846 
993 |x NEPOSILAT  |y EIZ 

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