Characterization in silicon processing

This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to disc...

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Bibliographic Details
Other Authors: Strausser, Yale.
Format: eBook
Language: English
Published: Boston : Greenwich : Butterworth-Heinemann ; Manning, ©1993.
Series: Materials characterization series.
Subjects:
ISBN: 9781591245254
9780080523422
9780750691727
Physical Description: 1 online zdroj (xiii, 240 pages) : illustrations.

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Summary: This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to discuss typical problems seen throughout that films' history, including characterization tools which are most effectively used to clarifying and solving those problems.
Bibliography: Includes bibliographical references and index.
ISBN: 9781591245254
9780080523422
9780750691727
Access: Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty univerzity