High density plasma sources design, physics, and performance
This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielec...
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| Other Authors | |
|---|---|
| Format | Electronic eBook |
| Language | English |
| Published |
Park Ridge, N.J. :
Noyes Publications,
©1995.
|
| Series | Materials science and process technology series. Electronic materials and process technology.
|
| Subjects | |
| Online Access | Full text |
| ISBN | 9781591240631 9780815513773 9780080946160 9780815517887 9780815517894 |
| Physical Description | 1 online zdroj (xx, 445 pages) : illustrations. |
Cover
| LEADER | 00000cam a2200000 a 4500 | ||
|---|---|---|---|
| 001 | 78840 | ||
| 003 | CZ-ZlUTB | ||
| 005 | 20251006170702.0 | ||
| 006 | m o d | ||
| 007 | cr |n | ||
| 008 | 011108s1995 njua sb 001 0 eng d | ||
| 020 | |a 9781591240631 |q (ebook) | ||
| 020 | |a 9780815513773 | ||
| 020 | |a 9780080946160 |q (ebook) | ||
| 020 | |a 9780815517887 |q (ebook) | ||
| 020 | |z 9780815517894 | ||
| 035 | |a (OCoLC)49708645 |z (OCoLC)49270409 |z (OCoLC)281603527 |z (OCoLC)313495240 |z (OCoLC)647803547 | ||
| 040 | |a KNOVL |b eng |e pn |c KNOVL |d OCLCQ |d TEF |d COO |d DEBSZ |d OCLCQ |d YDXCP |d OCLCQ |d KNOVL |d ZCU |d KNOVL |d OCLCF |d VRC |d OPELS |d N$T |d IDEBK |d E7B |d OCLCQ |d KNOVL | ||
| 245 | 0 | 0 | |a High density plasma sources |h [elektronický zdroj] : |b design, physics, and performance / |c edited by Oleg A. Popov. |
| 260 | |a Park Ridge, N.J. : |b Noyes Publications, |c ©1995. | ||
| 300 | |a 1 online zdroj (xx, 445 pages) : |b illustrations. | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a počítač |b c |2 rdamedia | ||
| 338 | |a online zdroj |b cr |2 rdacarrier | ||
| 490 | 1 | |a Materials science and process technology series. Electronic materials and process technology | |
| 504 | |a Includes bibliographical references and index. | ||
| 520 | 2 | |a This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. | |
| 505 | 0 | |a Helicon Plasma Sources -- Planar Inductive Sources -- Electrostatically-Shielded Inductively-Coupled RF Plasma Sources -- Very High Frequency Capacitive Plasma Sources -- Surface Wave Plasma Sources -- Microwave Plasma Disk Processing Machines -- Electron Cyclotron Resonance Plasma Sources -- Distributed ECR Plasma Sources -- References -- Index. | |
| 590 | |a Knovel Library |b ACADEMIC - Electronics & Semiconductors | ||
| 506 | |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty univerzity | ||
| 650 | 0 | |a Plasma density. | |
| 650 | 0 | |a High temperature plasmas. | |
| 650 | 0 | |a Plasma generators. | |
| 655 | 7 | |a elektronické knihy |7 fd186907 |2 czenas | |
| 655 | 9 | |a electronic books |2 eczenas | |
| 700 | 1 | |a Popov, Oleg A. | |
| 776 | 0 | 8 | |i Print version: |t High density plasma sources. |d Park Ridge, N.J. : Noyes Publications, ©1995 |z 0815513771 |w (DLC) 95004918 |w (OCoLC)32666280 |
| 830 | 0 | |a Materials science and process technology series. |p Electronic materials and process technology. | |
| 856 | 4 | 0 | |u https://proxy.k.utb.cz/login?url=http://app.knovel.com/hotlink/toc/id:kpHDPSDPP1/high_density_plasma_sources__design_physics_and_performance |
| 992 | |a BK |c KNOVEL | ||
| 999 | |c 78840 |d 78840 | ||
| 993 | |x NEPOSILAT |y EIZ | ||