High density plasma sources design, physics, and performance

This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielec...

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Bibliographic Details
Other Authors: Popov, Oleg A.
Format: eBook
Language: English
Published: Park Ridge, N.J. : Noyes Publications, ©1995.
Series: Materials science and process technology series. Electronic materials and process technology.
Subjects:
Plasma density.
High temperature plasmas.
Plasma generators.
elektronické knihy
electronic books
ISBN: 9781591240631
9780815513773
9780080946160
9780815517887
9780815517894
Physical Description: 1 online zdroj (xx, 445 pages) : illustrations.

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Table of contents

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007 cr |n
008 011108s1995 njua sb 001 0 eng d
020 |a 9781591240631  |q (ebook) 
020 |a 9780815513773 
020 |a 9780080946160  |q (ebook) 
020 |a 9780815517887  |q (ebook) 
020 |z 9780815517894 
035 |a (OCoLC)49708645  |z (OCoLC)49270409  |z (OCoLC)281603527  |z (OCoLC)313495240  |z (OCoLC)647803547 
040 |a KNOVL  |b eng  |e pn  |c KNOVL  |d OCLCQ  |d TEF  |d COO  |d DEBSZ  |d OCLCQ  |d YDXCP  |d OCLCQ  |d KNOVL  |d ZCU  |d KNOVL  |d OCLCF  |d VRC  |d OPELS  |d N$T  |d IDEBK  |d E7B  |d OCLCQ  |d KNOVL 
245 0 0 |a High density plasma sources  |h [elektronický zdroj] :  |b design, physics, and performance /  |c edited by Oleg A. Popov. 
260 |a Park Ridge, N.J. :  |b Noyes Publications,  |c ©1995. 
300 |a 1 online zdroj (xx, 445 pages) :  |b illustrations. 
336 |a text  |b txt  |2 rdacontent 
337 |a počítač  |b c  |2 rdamedia 
338 |a online zdroj  |b cr  |2 rdacarrier 
490 1 |a Materials science and process technology series. Electronic materials and process technology 
504 |a Includes bibliographical references and index. 
520 2 |a This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. 
505 0 |a Helicon Plasma Sources -- Planar Inductive Sources -- Electrostatically-Shielded Inductively-Coupled RF Plasma Sources -- Very High Frequency Capacitive Plasma Sources -- Surface Wave Plasma Sources -- Microwave Plasma Disk Processing Machines -- Electron Cyclotron Resonance Plasma Sources -- Distributed ECR Plasma Sources -- References -- Index. 
590 |a Knovel Library  |b ACADEMIC - Electronics & Semiconductors 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty univerzity 
650 0 |a Plasma density. 
650 0 |a High temperature plasmas. 
650 0 |a Plasma generators. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
700 1 |a Popov, Oleg A. 
776 0 8 |i Print version:  |t High density plasma sources.  |d Park Ridge, N.J. : Noyes Publications, ©1995  |z 0815513771  |w (DLC) 95004918  |w (OCoLC)32666280 
830 0 |a Materials science and process technology series.  |p Electronic materials and process technology. 
856 4 0 |u https://proxy.k.utb.cz/login?url=http://app.knovel.com/hotlink/toc/id:kpHDPSDPP1/high_density_plasma_sources__design_physics_and_performance  |y Plný text 
992 |a BK  |c KNOVEL 
999 |c 78840  |d 78840 
993 |x NEPOSILAT  |y EIZ 

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