Handbook of chemical vapor deposition principles, technology, and applications

CVD technology has grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is...

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Bibliographic Details
Main Author Pierson, Hugh O.
Format Electronic eBook
LanguageEnglish
Published Norwich, N.Y. : Noyes Publications, 1999.
Edition2nd ed.
SeriesMaterials science and process technology series. Electronic materials and process technology.
Subjects
Online AccessFull text
ISBN9781591240303
9780815517436
9780815514329
Physical Description1 online zdroj (xxiv, 482 pages) : illustrations.

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LEADER 00000cam a2200000 a 4500
001 78837
003 CZ-ZlUTB
005 20251006170702.0
006 m o d
007 cr |n
008 011105s1999 nyua sbf 001 0 eng d
020 |a 9781591240303  |q (ebook) 
020 |a 9780815517436  |q (ebook) 
020 |z 9780815514329 
035 |a (OCoLC)49708617  |z (OCoLC)49270298  |z (OCoLC)222565591  |z (OCoLC)639758659 
040 |a KNOVL  |b eng  |e pn  |c KNOVL  |d OCLCQ  |d TEF  |d DEBSZ  |d OCLCQ  |d UMC  |d AU@  |d BAKER  |d KNOVL  |d ZCU  |d KNOVL  |d OCLCF  |d CUS  |d OCLCQ  |d OCLCO  |d KNOVL  |d YDXCP 
100 1 |a Pierson, Hugh O. 
245 1 0 |a Handbook of chemical vapor deposition  |h [elektronický zdroj] :  |b principles, technology, and applications /  |c by Hugh O. Pierson. 
250 |a 2nd ed. 
260 |a Norwich, N.Y. :  |b Noyes Publications,  |c 1999. 
300 |a 1 online zdroj (xxiv, 482 pages) :  |b illustrations. 
336 |a text  |b txt  |2 rdacontent 
337 |a počítač  |b c  |2 rdamedia 
338 |a online zdroj  |b cr  |2 rdacarrier 
490 1 |a Materials science and process technology series. Electronic materials and process technology 
520 |a CVD technology has grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Readers will find data on both Plasma CVD and metallo-organic CVD processes. The book also explains the growing importance of CVD in production of semiconductor and related applications. 
504 |a Includes bibliographical references and index. 
590 |a Knovel Library  |b ACADEMIC - Electronics & Semiconductors 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty univerzity 
650 0 |a Vapor-plating  |v Handbooks, manuals, etc. 
650 0 |a Chemical vapor deposition  |v Handbooks, manuals, etc. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
776 0 8 |i Print version:  |a Pierson, Hugh O.  |t Handbook of chemical vapor deposition.  |b 2nd ed.  |d Norwich, N.Y. : Noyes Publications, 1999  |z 0815514328  |w (DLC) 99026065  |w (OCoLC)41090758 
830 0 |a Materials science and process technology series.  |p Electronic materials and process technology. 
856 4 0 |u https://proxy.k.utb.cz/login?url=http://app.knovel.com/hotlink/toc/id:kpHCVDCVD4/handbook_of_chemical_vapor_deposition_cvd__principles_technology_and_applications_2nd_edition 
992 |a BK  |c KNOVEL 
999 |c 78837  |d 78837 
993 |x NEPOSILAT  |y EIZ