Handbook of deposition technologies for films and coatings science, technology, and applications

A decade after the first edition of this volume was published, this second edition is being brought out to update the many improvements in deposition technologies, its mechanisms, and applications. The entire volume has been extensively revised and contains at least 50% more material. Five chapters...

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Bibliographic Details
Other Authors Bunshah, R. F.
Format Electronic eBook
LanguageEnglish
Published Park Ridge, N.J. : Noyes Publications, ©1994.
Edition2nd ed.
SeriesMaterials science and process technology series. Electronic materials and process technology.
Subjects
Online AccessFull text
ISBN9781591240457
9780815517450
9780815513377
Physical Description1 online zdroj (xxvi, 861 pages) : illustrations.

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504 |a Includes bibliographical references and index. 
505 0 0 |t Deposition technologies : an overview /  |r Rointan F. Bunshah --  |t Plasmas in deposition processes /  |r John A. Thornton and Joseph E. Greene --  |t Surface preparation for film and coating deposition processes /  |r Donald M. Mattox --  |t Evaporation : processes, bulk microstructures and mechanical properties /  |r Rointan F. Bunshah --  |t Sputter deposition processes /  |r John A. Thornton and Joseph E. Greene --  |t Ion plating /  |r Donald M. Mattox --  |t Chemical vapor deposition /  |r Jan-Otto Carlsson. 
505 0 0 |t Plasma-enhanced chemical vapor deposition /  |r Arthur Sherman --  |t Plasma-assisted vapor deposition processes : overview /  |r Rointan F. Bunshah --  |t Deposition from aqueous solutions : an overview /  |r Morton Schwartz --  |t Advanced thermal spray deposition techniques /  |r Robert C. Tucker, Jr. --  |t Non-elemental characterization of films and coatings /  |r Donald M. Mattox --  |t Nucleation, film growth, and microstructural evolution /  |r Joseph E. Greene --  |t Metallurgical applications /  |r Rointan F. Bunshah --  |t Characterization of thin films and coatings /  |r Gary E. McGuire. 
505 0 0 |t Jet vapor deposition /  |r Bret L. Halpern and Jerome J. Schmitt. 
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506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty univerzity 
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